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chemical vapor deposition coating

См. также в других словарях:

  • Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

  • Chemical vapor deposition of diamond — Colorless gem cut from diamond grown by chemical vapor deposition Chemical vapor deposition of diamond or CVD is a method of producing synthetic diamond by creating the circumstances necessary for carbon atoms in a gas to settle on a substrate in …   Wikipedia

  • Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v …   Wikipedia

  • Physical vapor deposition — (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces (e.g., onto semiconductor wafers). The… …   Wikipedia

  • Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… …   Wikipedia

  • Coating — is a covering that is applied to the surface of an object, usually referred to as the substrate. In many cases coatings are applied to improve surface properties of the substrate, such as appearance, adhesion, wetability, corrosion resistance,… …   Wikipedia

  • Vacuum deposition — Not to be confused with Vacuum coating. Vacuum deposition is a family of processes used to deposit layers atom by atom or molecule by molecule at sub atmospheric pressure (vacuum) on a solid surface. The layers may be as thin as one atom to… …   Wikipedia

  • Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some …   Wikipedia

  • List of coating techniques — This list contains an overview of coating techniques for thin film deposition, found in the field of materials science. The techniques can be classified as follows: Chemical vapor deposition (CVD) * Metalorganic vapour phase epitaxy *… …   Wikipedia

  • Atomic layer deposition — (ALD) is a gas phase chemical process used to create extremely thin coatings. The majority of ALD reactions use two chemicals, typically called s. These precursors react with a surface one at a time in a sequential manner. By exposing the… …   Wikipedia

  • Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… …   Wikipedia

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